| 1. | Magnetization magneto - microwave plasma etching system
磁场微波型等离子体蚀刻系统 |
| 2. | Inductively coupled plasma etching system
感应耦合型等离子体蚀刻系统 |
| 3. | Barrel type plasma etching system
圆筒型等离子体蚀刻系统 |
| 4. | Plasma etching system
等离子体蚀刻系统 |
| 5. | Inductively coupled plasma etching technology and its application in optoelectronic devices fabrication
刻蚀技术及其在光电子器件制作中的应用 |
| 6. | Hardware and software design for the inductively coupled plasma etching machine " s system are also presented
介绍了plc控制等离子体刻蚀机的硬件系统和软件系统的设计。 |
| 7. | The reactor is capable of working in the rie ( reactive ion etching ) mode and also in the plasma etching mode
反应腔拥有在rie (反应离子刻蚀)模式和等离子刻蚀模式下工作的能力。 |
| 8. | Effect of microwave plasma etching decarburization onadhesive strength and cutting performance of cvd diamond coated tools
微波等离子体刻蚀处理对金刚石薄膜涂层刀具附着力和切削性能的影响 |
| 9. | Plasma etching has been widely used in the etching process of si devices . now the study is focused on the microfabrication of compound semiconductor
等离子体干法刻蚀在硅器件的微细加工中已经得到广泛应用，目前研究的焦点集中在化合物半导体。 |
| 10. | Microwave electron cyclotron resonance ( mwecr ) cvd is a newly developed technique for plasma processing and materials fabrication , such as plasma etching and films deposition
本论文介绍了我们对ecr等离子体cvd系统的测试、 bn薄膜的制备和薄膜光学特性研究。 |
